C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/278.5, 260/2
C07D 211/36 (2006.01) A61K 31/445 (2006.01) C07D 401/04 (2006.01) C07D 471/10 (2006.01)
Patent
CA 1036607
Abstract of the Disclosure: Phenoxypropylamine derivatives of the formula: Image wherein Y is Image , Image or Image (in which R2 is a halogen atom or a tri- fluoromethyl group) and R1 is a halogen atoms or a C1-C4 alkyl or C2-C4 alkenyl group, and their pharmaceutically acceptable salts, which are useful as neuroleptic agents and can be prepared by reacting a compound of the formula: Image wherein X is a halogen atom and R1 is as defined above with the compound of the formula: H-Y wherein Y is as defined above. - 1 -
220545
Inaba Shigeho
Maruyama Isamu
Nakao Masaru
Sasajima Kikuo
Yamamoto Hisao
LandOfFree
Phenoxypropylamine derivatives and preparation thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Phenoxypropylamine derivatives and preparation thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phenoxypropylamine derivatives and preparation thereof will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-664888