C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
400/3007, 400/72
C08L 83/08 (2006.01) C08G 73/10 (2006.01) C08G 77/455 (2006.01) H01B 3/30 (2006.01) H01B 3/46 (2006.01) H01L 23/29 (2006.01) H01L 23/31 (2006.01)
Patent
CA 1163742
BA0004 PRECURSOR SOLUTIONS OF SILICONE COPOLYMER MATERIALS MADE FROM A SILOXANE CONTAINING A BIS-AMINO ARYL ETHER OF A BIS-AMINO THIO ETHER IN DIAIKLY ETHERS OF CONDENSED POLYETHYLENE GLYCOLS Abstract A precursor solution of a copolymer material which is the product of the condensation reaction of an organic diamine with a siloxane containing a bis-amino aryl ether or bis-amino aryl thioether with molar amounts of an organic dianhydride in a solvent which is at least one selected from the group consisting of monoalkyl ethers of ethylene glycol, monoalkyl ethers of condensed polyethylene glycol, dialkyl ethers of ethylene glycol, dialkyl ethers of condensed poly- ethylene glycol and cyclic ethers containing no less than a 5 member ring is suitable for use as a wire coating, passi- vation and/or protective coating for semiconductor devices and the like. A part or all of the organic diamine may be a macrocyclic crown ether which enables the copolymer mat- erial to have a chemically bonded chelant embodied therein. The copolymer material of the precursor solution may be of a block type configuration, a random type configuration, or both, and either may be cured at a low temperature such as 75°C when the solvent is diglyme. Inventor: Abe Berger
346610
Berger Abe
Fetherstonhaugh & Co.
M. & T. Chemicals Inc.
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