Method of making etched-striped substrate planar laser

Details Method of making etched-striped substrate planar laser Method of making etched-striped substrate planar laser

H - Electricity

01

S

345/32

H01S 5/223 (2006.01) H01L 29/06 (2006.01)

Patent

CA 1083254

METHOD OF MAKING ETCHED-STRIPED SUBSTRATE PLANAR LASER ABSTRACT OF THE INVENTION A method of making a diode laser in which a pump current confining channel is formed on the substrate side of a diode laser prior to growth of the active or recombination region of the diode laser. The current confining channel is formed by providing, by diffusion, a rectifying junction on a substrate surface and then forming, by etching, a narrow channel completely through a central portion of the diffused layer and the rectifying junction. The remaining layers of the diode laser are then successively grown. The portions of the rectifying junction on both sides of the channel are reverse biased when the primary junction of the diode laser is forward biased whereby pump current flow is confined to a path through the channel.

303234

Affiliated with

Also associated with

Rating

Method of making etched-striped substrate planar laser does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making etched-striped substrate planar laser, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making etched-striped substrate planar laser will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-803749