Polyphosphazene polymers containing n-substituted amido and...

Details Polyphosphazene polymers containing n-substituted amido and... Polyphosphazene polymers containing n-substituted amido and...

C - Chemistry, Metallurgy

08

G

402/355, 260/386

C08G 79/02 (2006.01) C07F 9/65 (1980.01)

Patent

CA 1125777

ABSTRACT OF THE DISCLOSURE Polyphosphazene polymers are prepared which contain re??ting units represented by the formulas: Image Image Image wherein X is represented by: Image Image wherein Y is selected from the group consisting of nnd - SO2 - and p = O or l; when p = 0, R1 and R2 are independently selected from a group consisting of substi- tuted or unsubstituted aliphatic, aryl, araryl, and alkylaryl radicals or R1 and R2 can form a cyclic amide containing radical wherein R1 and R2 taken together are selected from a group consisting of -(CH2)-n where n = 2 to 12, wherein R3 is a lower alkyl radical or hydrogen; and when p = 1, R1 and R2 taken together form a linkage in a cyclic imide containing radical selected from a group consisting of -(CH2)-n, where n' = 2 or 3 and Image where R3 is as defined above, R4 is selected from the group consisting of hydrogen, halogen and alkyl radical containing 1 to 6 carbon atoms; and p' is 0 to 4, X' is a substituted or unsubstituted alkoxy, aryloxy, amino or mercapto substituent group or mixtures thereof which are compatible with an N- substituted amido substituent and are known in the state of the art of polyphosphazene technology; and 20? (w + y + z)? 50,000 per polymer and (y + z)> 0. The polymers of the lnvention can be utilized to form protective films and can als0 be utilized in applications such as for molding, coatings, foams and the like.

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