C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/305, 167/9.8
C07D 409/12 (2006.01) A01N 43/50 (2006.01) C07D 233/60 (2006.01)
Patent
CA 1166260
Abstract: 1-phenethylimidazole compounds of the formula: Image wherein R1 and R2 are independently hydrogen or halogen, Z is a 2 or 3-thienyl moiety of the formula: Image wherein R3 is hydrogen, halogen, (lower) alkyl, or trifluoromethyl, and the antimicrobial acid addition salts thereof, are useful as antifungal and antibacterial agents.
389516
Hudyma Thomas W.
Partyka Richard A.
Bristol-Myers Squibb Company
Gowling Lafleur Henderson Llp
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