Radiation-sensitive mixture containing an acid generator and...

Details Radiation-sensitive mixture containing an acid generator and... Radiation-sensitive mixture containing an acid generator and...

C - Chemistry, Metallurgy

08

L

96/178

C08L 69/00 (2006.01) C08G 65/16 (2006.01) G03F 7/004 (2006.01) G03F 7/022 (2006.01)

Patent

CA 1133743

Hoe 79/K 031 RADIATION-SENSITIVE MIXTURE AND PROCESS FOR THE PRODUCTION OF RELIEF IMAGES Abstract of the Disclosure A radiation-sensitive mixture is described which contains (a) a compound which forms an acid under the action of actinic radiation, and (b) a polymeric compound having recurrent ortho- carboxylic acid ester groupings, and which comprises a polymeric compound which is built up from recurrent units of the formula I: Image (I) wherein R1 is a hydrogen atom or an alkyl, cycloalkyl or aryl group, R2, R3 and R5 are identical or different and denote hydro- gen atoms or alkyl or aryl groups, R4 denotes an alkylene group or - if a1 = a2 = 1 - also an alkyleneoxy group, it being pos- sible for the alkylene groups to be interrupted by hetero-atoms or by unsaturated or cyclic groups, R6 denotes a hydrogen atom or a methyl group, a1 and a2 each denote 0, 1 or 2, a1 + a2 Hoe 79/K 031 denotes 1 or 2 and m denotes a number from 3 to 200. The mix- tures are suitable for the production of reprographic materials, in particular printing plates, of high photosensitivity.

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