C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/285, 260/266
C07D 401/04 (2006.01) A01N 43/42 (2006.01) A01N 43/60 (2006.01) C07D 215/56 (2006.01)
Patent
CA 1141383
Abstract of the Disclosure A quinoline carboxylic acid derivative of the general formula Image [wherein R1 and R2 are a lower alkyl group,respectively, and R3 is a halogen atom or 1-piperazinyl group] and its salt are of value as an antimicrobial agent for medical treatment and agricultural and horticultural uses.
346373
Ishikawa Hiroshi
Nakagawa Kazuyuki
Tabusa Fujio
Marks & Clerk
Otsuka Pharmaceutical Co. Ltd.
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