C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/295, 260/309
C07D 277/82 (2006.01) C07D 213/74 (2006.01) C07D 295/096 (2006.01)
Patent
CA 1050985
ABSTRACT OF THE DISCLOSURE The disclosure relates to substituted-phenyl substituted- alkyl ethers of the formula: Image wherein R1 is lower alkyl, cycloalkyl, aryl, ar(lower) alkyl, a heterocyclic group or a group represented by the formula: Image wherein R3 and R4 are each hydrogen or lower alkyl, R5 is carboxy, esterified carboxy or hydroxymethyl and A is lower alkylene: R2 is hydrogen, lower alkyl, cycloalkyl, aryl, ar(lower)alkyl, a heterocyclic group or a group represented by the formula: Image wherein R3, R4, R5 and A are each as defined above: R3, R4, R5 and A are each as defined above; and R6 is hydrogen, hydroxy or lower alkoxy; in which the aryl or the ar(lower)alkyl for R1 and R2 may be substituted with halogen, hydroxy or lower alkoxy, and when R1 and R2 are both lower alkyl, R1 and R2 may be linked together; and pharmaceutically acceptable salts thereof. These ethers have hypolipidemic activity. Processes for preparing these compounds are also disclosed.
228557
Kamiya Takashi
Saito Yoshihisa
Fujisawa Pharmaceutical Co.
Na
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