C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/518, 260/479
C07D 205/08 (2006.01)
Patent
CA 1052811
Abstract of the Disclosure New cyclic a ino acids of the formula Image (I) in which R1 represenes a hydrogen atoo or a lower alkyl radical and n is 4, 5 or 6, and their pharmacologically compatible salts are disclosed, as well as processes for their preparation. The compounds (I) exhibit hypothermal and, in some cases, narcosis-potentiating or sedating properties.
242147
Hartenstein Johannes
Heldt Wolfgang
Herrmann Manfred
Satzinger Gerhard
Na
Warner-Lambert Company
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