C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 413/12 (2006.01) A61K 31/42 (2006.01)
Patent
CA 2074004
Compounds of the formula (see formula I) wherein: Y is alkylene of 3 to 9 carbon atoms; R1 is lower-alkyl, lower-alkoxy-(C1-3-alkyl), lower- alkoxycarbonyl, cyclopropyl or trifluoromethyl; R2 and R3 independently are hydrogen, lower-alkyl, halogen, lower-alkoxy, nitro, trifluoromethyl or hydroxy; and R4 is hydrogen or lower-alkyl; where lower-alkyl and lower-alkoxy, each occurrence, have from 1-5 carbon atoms; with the proviso that when R1 is lower-alkyl, at least one of R2 and R3 is hydroxy; or pharmaceutically acceptable acid- addition salts thereof are useful as antiviral agents, particularly against picornaviruses, including numerous strains of rhino- virus.
Bailey Thomas Robert
Diana Guy Dominic
Fetherstonhaugh & Co.
Sanofi-Synthelabo
Sterling Winthrop Inc.
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