C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/208, 260/301
C07D 285/10 (2006.01) A61K 31/41 (2006.01) C07D 209/48 (2006.01) C07D 417/12 (2006.01)
Patent
CA 1267140
11871 A B S T R A C T Compounds of the formula (I) :- Image (I) or pharmaceutically acceptable salts are described, wherein R1 and R2 are independently hydrogen or C1-6alkyl, or R1 and R2 together represent - (CH2)q- wherein q is 4 to 7, to form together with the nitrogen atom to which they are attached, a 5-8 membered saturated ring, optionally substituted by C1-6alkyl; X is -CH2- or sulphur; n is 2 or 3, or if X is -CH2- n can also be 1; p is 1 or 2; and R3 is hydrogen, C1-6alkyl, C3-6alkenyl or C3-6alkynyl (wherein the unsaturated bond is not adjacent to the -NH- moiety). The compounds are histamine H2-receptor antagonists and are useful in treating diseases mediated via histamine H2-receptors. Processes for their preparation, pharmaceutical compositions containing them and methods of use are described.
499646
Blurton Peter
Brown Thomas H.
Blurton Peter
Brown Thomas H.
Gowling Lafleur Henderson Llp
Smith Kline & French Laboratories Limited
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