C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/313, 167/9.7
C07D 249/08 (2006.01) A01N 43/653 (2006.01) C07C 33/50 (2006.01) C07C 309/66 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1133492
ABSTRACT OF THE DISCLOSURE Compounds are disclosed having the formula Image and the physiologically acceptable acid addition salts thereof, wherein: Ar is a member selected from the group consisting of phenyl, mono-, di- and tri-halophenyl, lower alkylphenyl, lower alkyloxy- phenyl, nitrophenyl, cyanophenyl and trifluoromethylphenyl; and R is a member selected from the group consisting of alkyl having from 1 to 10 carbon atoms, cycloalkyl, cycloalkyl-lower alkyl, lower alkenyl, aryl-lower alkyl, aryloxy-lower alkyl and a radical of the formula -O-R1, wherein R1 is selected from the group consisting of alkyl having from 1 to 10 carbon atoms, lower alkenyl, lower alkynyl and aryl-lower alkyl, said aryl being selected from the group consisting of phenyl, naphthalenyl and substituted phenyl, wherein said substituted phenyl is phenyl having from 1 to 3 substituents independently selected from the group consisting of halo, lower alkyl, lower alkyloxy, cyano, nitro and phenyl provided that when more than 1 substituents are present only 1 thereof may be selected from the group consisting of cyano, nitro and phenyl; these novel compounds have fungicidal and plant-growth regulating properties.
283776
Backx Leo J.j.
Heeres Jan
Mostmans Joseph A.
Gowling Lafleur Henderson Llp
Janssen Pharmaceutica Naamloze Vennootschap
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