C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/319, 260/311
C07D 209/40 (2006.01) C07D 263/58 (2006.01) C07D 277/82 (2006.01)
Patent
CA 1183540
Abstract of the Disclosure Described are compounds of the formula Image wherein R is hydrogen or loweralkyl, X and Y independently of one another denote hydrogen, halogen, loweralkyl, nitro, amino, amido, loweralkoxy, hydroxy, nitrile, methylsulfone, methylsulfoxide, methylmercapto, trifluoromethyl or benzyloxy; Z is oxygen, sulfur or -CH2; n and m are each integer from 0 to 6 inclusive, and pharmaceutically acceptable salts thereof. The compounds are effect as anti-inflammatory agents.
412861
Fischer Francis E.
Haviv Fortuna
Ratajczyk James D.
Abbott Laboratories
Macrae & Co.
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