[1,2]-fused-1,4-benzodiazepine compounds, process for their...

Details [1,2]-fused-1,4-benzodiazepine compounds, process for their... [1,2]-fused-1,4-benzodiazepine compounds, process for their...

C - Chemistry, Metallurgy

07

D

260/239.5, 260/2

C07D 401/04 (2006.01) C07D 405/04 (2006.01) C07D 409/04 (2006.01)

Patent

CA 1199323

ABSTRACT OF THE DISCLOSURE The present invention provides compounds correspond- ing to the formula II or III Image II Image III wherein R1 repesents a hydrogen or halogen atom, a lower alkyl radical, a lower alkoxy radical or a nitro group, and R2 represents a hydrogen or halogen atom, a lower alkyl radi- cal, a lower alkoxy radical or a nitro group, or, if R1 is a hydrogen atom, R2 may also be a lower alkylthio radical or a trifluoromethyl radical; or R1 and R2 are bonded to adjacent carbon atoms and together denote a methylenedioxy or ethylene- dioxy radical; R3 represents a radical selected from the group consisting of radicals corresponding to the formula a, b, c and d Image Image Image Image a b c d in which R5 is a hydrogen, fluorine, chlorine or bromine atom, a lower alkyl radical or a nitro group and R6 is a hydrogen atom, a C1-C5-alkyl radical, a C2-C5-alkyl radical which is terminally substituted by a hydroxyl group or a methoxy radical, a C3-C5-alkenyl radical or a cyclopropyl- methyl radical; n is zero or, if R3 is the radical a or b, n is 0 or 1; and Y is a halogen atom, a lower alkanesulfonyloxy radical, a benzenesulfonyloxy radical or a benzenesulfonyloxy radical in which the benzene ring is substituted by a lower alkyl radical or halogen atom. The compounds are intermediates in the preparation of [1,2]-fused 1,4-benzodiazepine compounds corresponding to the general formula I Image I wherein X is an oxygen or sulfur atom or an optionally sub- stituted imino group, R1 is a hydrogen or halogen atom, lower alkyl radical, a lower alkoxy radical or a nitro group and R2 is a hydrogen or halogen atom, a lower alkyl radical, a lower alkoxy radical or a nitro group, or if R1 is a hydrogen atom, R2 may also be a lower alkylthio radical, or, if R1 is a hydrogen atom and X is a sulfur atom or an imino group, R2 may be a trifluoromethyl radical; or R1 and R2 are bonded to adjacent carbon atoms and together denote a methylene- dioxy or ethylenedioxy radical, R3 is an optionally substi- tuted furyl, thienyl, pyrrolyl or pyridyl radical and n is zero or, if R3 is furyl or thienyl, n may be 0 or 1 and their pharmaceutically acceptable acid addition salts which com- pounds exhibit neuroleptic properties.

476716

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