C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
96/179, 260/305.
C07D 403/02 (2006.01) C07D 235/20 (2006.01) C07D 249/18 (2006.01) G03F 7/022 (2006.01)
Patent
CA 1326031
- 17 - 1,2-Naphthoquinone Diazide Sulfonyl Ester Compounds with Linking Benzotriazole Groups Abstract Compounds of the general formula (I) or (II) Image (I) or Image (II), in which R is 1,2-naphthoquinone-2-diazide-4- or -5-sulfonyl and X is a straight-chain or branched C1-C12-alkylene group, which is unsubstituted or mono- or disubstituted by OH group or is -CH=CH-, are suitable as the light-sensitive component in photoresist materials. Both positive and negative images can be prepared with light-sensitive mixtures containing these compounds and a binder.
549303
Ag Ciba-Geigy
Fetherstonhaugh & Co.
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