C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
204/91.23, 260/3
C07D 317/40 (2006.01) C07D 307/46 (2006.01) C07D 317/46 (2006.01) C07D 317/64 (2006.01) C07D 499/00 (2006.01)
Patent
CA 1168251
Abstruct of the Disclosure A 1,3-dioxolen-2-one derivative of the general formula Image wherein R1 represents a hydrogen atom, a methyl group, or an aryl group, R2 represents a hydrogen atom, or may be taken together with R1 to form a divalent carbon chain residue, and X represents a halogen atom. The above compound can be prepared by reacting a compound of the general formula Image with a halogenating agent, and ia useful as protective group- introducing reagents for introducing protective groups into reagents in various chemical reactions, or as modifiers for prodrug preparation in medicine.
376391
Ikeda Shoji
Sakamoto Fumio
Tsukamoto Goro
Utsumi Isamu
Kanebo Ltd.
Smart & Biggar
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