C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 409/14 (2006.01) A61K 31/405 (2006.01) A61P 3/10 (2006.01) C07D 413/14 (2006.01)
Patent
CA 2621474
Compounds are described that are active on PPARs, including pan-active compounds and compounds selective for any one or any two of PPAR.alpha., PPAR.gamma. and PPAR.delta.. Also describe are methods of use of the compounds in treating various diseases.
L'invention concerne des composés qui sont actifs sur les PPAR, y compris les composés ayant une activité sur pan et des composés sélectifs pour un ou deux quelconques de PPARa, PPAR? et PPARd. L'invention concerne également des procédés d'utilisation de ces composés dans le traitement de diverses maladies.
Artis Dean R.
Ibrahim Prabha N.
Lee Byunghun
Lin Jack
Shi Shenghua
Borden Ladner Gervais Llp
Plexxikon Inc.
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