C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 413/06 (2006.01) A61K 31/55 (2006.01) C07D 243/14 (2006.01) C07D 401/06 (2006.01) C07D 403/06 (2006.01) C07D 405/06 (2006.01) C07D 413/14 (2006.01) C07D 417/06 (2006.01)
Patent
CA 2150461
Compounds of general formula (I) and physiooogically acceptable salts thereof; wherein R1 represents CH2CONR5R6 or CH2COR7; R2 represents a phenyl group optionally substi- tuted by 1 or 2 substituents selected from halo- gen, alkyl, nitro, cyano, trifluoromethyl,tri- fluoromethoxy, alkylthio, alkylsulphinyl, alkyl- sulphonyl, amino, substituted amino, hydroxy, alkoxy, methylenedioxy,alkoxycarbonyl,oxa- zolyl or oxadiazolyl; A represents a C1-4 straight or branched alkylene chain; R3 and R4 indepen- dently represent hydrogen or C1-4alkyl or R3 and R4 together with the nitrogen atom to which they are attached form a saturated 5-7 membered heterocyclic ring, which ring may contain an additional heteroatom selected from oxygen, sulphur or nitrogen; R5 represents hydrogen or C1-4 alkyl; R6 represents C1-4alkyl or phenyl, optionally by halogen, or R5 and R6 together with the nitrogen atom to which they are attached represent a saturated 5 to 7 membered hetercyclic ring which may be optionally substituted by 1 or 2 methyl groups or fused to a benzene ring; R7 represents a group selected from C1-4alkyl or optionally substituted phenyl; R8 represents hydrogen or a halogen atom; n is zero, 1 or 2, are antagonists of gastrin and CCK.
Armour Duncan Robert
Box Philip Charles
Shah Pritom
Glaxo Group Limited
Riches Mckenzie & Herbert Llp
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