C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/287, 260/319
C07D 215/22 (2006.01) C07D 209/12 (2006.01) C07C 93/14 (1980.01)
Patent
CA 1180326
?4-DIOXASPIRO[4,5] DECENE COMPOUNDS ABSTRACT OF THE DISCLOSURE A process for preparing 3-substituted-2-hydroxypropyl aryl ether .beta.-blockers of the formula; Image wherein Y is halogen, hydroxy, lower acyloxy, amino, lower alkylamino, lower aralkylamino, lower acylamino, di-lower alkylamino, lower alkyleneamino, N-lower alkyl-N-lower aralkylamino, di-lower acylamino, N-lower aklyl-N-lower acylamino or N-tri-lower alkylsilylamino; one of P and R combined together with Q shows lower alkylene or alkenylene optionally interrupted by O, N or S and optionally substituted by lower alkyl, lower araklyl, lower carboxylic acyl, carboxy, protected carboxy; hydroxy, lower alkoxy, lower acyloxy, oxo; amino, lower alkylamino, lower acylamino, nitro, nitroso, lower alkylthio, lower sulfonic acyl or halogen; and remaining R and P is hydrogen or halogen which comprises aromatizing a 2-(substituted methyl) -1,4,dioxaspiro[4,5]-decene compound of the formula: Image wherein P, Q, R and Y are as defined above and X is a hydrogen atom or halogen and the dotted line shows, if X is hydrogen, two double bonds or shows, if X is halogen, the presence of 1 double bond.
407793
Johnson Douglas S. Q.c.
Shionogi & Co. Ltd.
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