C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/315.4, 260/3
C07D 231/08 (2006.01) C07D 405/10 (2006.01) C07D 498/04 (2006.01)
Patent
CA 1210763
ABSTRACT OF THE DISCLOSURE A compound corresponding to one of the isomeric formulae II or III Image Image II III wherein R1 is a hydrogen or halogen atom, or a lower alkyl, lower alkoxy, hydroxyl, trifluoromethyl or lower alkanoyl- oxy group, R2 is a hydrogen or halogen atom, or a lower alkyl or lower alkoxy group, or R1 and R2 are bonded to adjacent carbon atoms and together denote a methylene- dioxy or ethylenedioxy group, R3 is a hydrogen or halogen atom, or a lower alkyl, lower alkoxy, hydroxy, trifluoro- methyl or lower alkanoyloxy group, R4 is a hydrogen or halogen atom, or a lower alkyl or lower alkoxy group, or R3 and R4 are bonded to adjacent carbon atoms and together denote a methylenedioxy or ethylenedioxy group Z is an alkylene group with 2 to 6 carbon atoms, Z' is an alkylene group with 2 to 4 carbon atoms, Y is a radical which can be split off by aminolysis, and Y' is a halogen atom, and acid addition salts thereof. Processes of preparing these compounds are also disclosed. These compounds are useful intermediates in the preparation of pharmaceutical compounds.
488742
Heinemann Henning
Jasserand Daniel
Milkowski Wolfgang
Yavordios Dimitri
Zeugner Horst
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
Solvay Pharmaceuticals Gmbh
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