C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 209/04 (2006.01) A61K 31/40 (2006.01) C07D 209/08 (2006.01) C07D 209/36 (2006.01)
Patent
CA 2132883
Abstract The present invention is concerned with indole derivatives of the general formula Image I wherein R1 to R4 signify hydrogen, halogen, lower-alkyl, cycloalkyl or trifluoromethyl, R5 and R6 signify hydrogen, halogen, lower-alkyl, cycloalkyl, trifluoromethyl, hydroxy or lower-alkoxy and R7 signifies hydrogen or lower-alkyl, as well as pharmaceutically acceptable acid addition salts of the compounds of formula 1. They are suitable for the treatment or prevention of central nervous disorders such as depressions, bipolar disorders, anxiety states, sleep and sexual disorders, psychoses, schizophrenia, migraine and other conditions associated with cephalic pain or pain of a different kind, personality disorders or obsessive- compulsive disorders, social phobias or panic states, mental organic disorders, mental disorders in childhood, aggressiveness, age-associated memory impairment and behavioural disorders, addiction, obesity, bulimia etc.; central nervous system damage caused by trauma, stroke, neurodegenerative diseases etc.; cardiovascular disorders such as hypertension, thrombosis, stroke, and gastrointestinal disorders such as dysfunction of the gastrointenstinal tract motility.
F. Hoffmann-La Roche Ag
Gowling Lafleur Henderson Llp
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