C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
71/7.25, 260/335
C07D 205/08 (2006.01) A01N 43/44 (2006.01)
Patent
CA 1204764
ABSTRACT OF THE DISCLOSURE Compounds of the the formula: Image wherein R1 is lower alkyl or benzyl. R2 is lower alkoxy, benzyloxy, or the group -NHCH2?R3 where R3 is lower alkoxy; and Ar is phenyl optionally substituted with 1 to 3 substituents independently selected from halogen, trihalomethyl, nitro or lower alkyl, show plant growth regulating activity.
452167
Chevron Research And Technology Company
Smart & Biggar
LandOfFree
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