C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/273
C07D 471/04 (2006.01)
Patent
CA 1147731
Abstract of Disclosure The prevent invention provides a 1,8-naphthyridine compound of the formula Image wherein R is hydrogen, methyl, ethyl or propyl, and a nontoxic pharmaceutically acceptablo salt thereof, and a process for preparing a 1,8-naphthyridine compound of the above formula which comprises (A) reacting a compound of the formula IMG> wheroin Y is halogen, lower alkoxy, lower alkylthio, lower alkylsulfinyl, lower alkylsulfonyl, lower alkyloulfonyloxy or arylsulfonyloxy, and R1 is hydrogen or lower alkyl, with a compound of the formula Image
361099
Matsumoto Jun-Ichi
Nishimura Yoshiro
Takase Yoshiyuki
Dainippon Pharmaceutical Co. Ltd.
Laboratoire Roger Bellon
Smart & Biggar
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