C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 249/08 (2006.01) A01N 43/54 (2006.01) A01N 43/653 (2006.01) A01N 43/72 (2006.01) C07D 233/56 (2006.01) C07D 401/06 (2006.01) C07D 405/06 (2006.01) C07D 409/06 (2006.01) C07D 413/06 (2006.01) C07D 417/06 (2006.01) C07D 521/00 (2006.01)
Patent
CA 2054372
O.Z. 0050/41997 Abstract of the Disclosure: 1-Halo-1-azolylmethane derivatives of the formula Image where A and B are each alkyl, benzyl, benzoyl, acyl, biphenyl- yl, naphthyl, hetaryl or phenyl, it being possible for each of these radicals to be substituted; D is Cl or Br, X is CH or N, and their plant-compatible acid addition salts and metal complexes are used as fungicides.
Ammermann Eberhard
Goetz Norbert
Lorenz Gisela
Saupe Thomas
Seele Rainer
Basf Aktiengesellschaft
Robic
LandOfFree
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