C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 477/00 (2006.01) C07D 477/20 (2006.01) C07F 7/10 (2006.01)
Patent
CA 2050255
The present invention is directed to 1-methylcarbapenem derivatives of the formula: Image wherein R1 is a hydrogen atom or a hydroxy-protecting group, R2 is a hydrogen atom or an ester residue, R3 is a hydrogen atom or a lower alkyl group, or salts thereof. Such derivatives have excellent antimicrobial activities and are useful as antimicrobial drugs.
Horikawa Hiroshi
Iwasaki Tameo
Kondo Kazuhiko
Matsushita Tadahiro
Yamaguchi Totaro
Kirby Eades Gale Baker
Tanabe Seiyaku Co. Ltd.
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