C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 417/06 (2006.01) A61K 31/427 (2006.01) A61K 31/4427 (2006.01) A61P 35/00 (2006.01) C07D 303/00 (2006.01) C07D 313/00 (2006.01) C07D 401/06 (2006.01) C07D 405/06 (2006.01) C07D 493/04 (2006.01) C07D 493/08 (2006.01) C07F 7/18 (2006.01)
Patent
CA 2361278
The invention relates to novel epothilone derivatives of general formula (I), wherein R8 means a halogen atom, especially a fluorine or chlorine atom, and the remaining substituents have the meanings given in the description. The novel compounds are suitable for producing medicaments.
La présente invention concerne de nouveaux dérivés d'épothilon correspondant à la formule générale (I), dans laquelle R?8¿ représente un atome d'halogène, en particulier un atome de fluor ou de chlore, les autres substituants ayant la signification donnée dans la description. Ces nouveaux composés conviennent pour la production de médicaments.
Buchmann Bernd
Klar Ulrich
Schirner Michael
Schwede Wolfgang
Skuballa Werner
Marks & Clerk
Schering Aktiengesellschaft
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