C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/226, 260/287
C07D 215/22 (2006.01) A61K 31/47 (2006.01) C07D 215/227 (2006.01) C07D 215/36 (2006.01)
Patent
CA 1258858
ABSTRACT Compounds of the formula: Image wherein X stands for an oxygen or sulphur atom, n stands for 1 or 2, R1 stands for a defined (3-4C)alkyl radical, a cyclopropyl radical, or a phenyl radical which may optionally bear a halogeno, (1-4C)alkyl or (1-4C)alkoxy substituent, and R2 stands for hydrogen or a (1-4C)alkyl radical, and pharmaceutically-acceptable acid-addition salts thereof. Process for the manufacture of said compounds. Pharmaceutical compositions comprising one of said compounds and a pharmaceutical diluent or carrier. The compunds are peripherally selective 5-HT antagonists.
448590
Imperial Chemical Industries Plc
Smart & Biggar
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