C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
400/5015, 400/70
C07D 249/20 (2006.01) C07C 37/14 (2006.01) C08K 5/34 (2006.01) C08K 5/3475 (2006.01) C09B 29/15 (2006.01) C09D 7/12 (2006.01)
Patent
CA 1146948
Abstract Compounds of the formula I Image I in which T1 is hydrogen or chlorine and T2 und T3 inde- pendently of one another are the group Image in which T4 is hydrogen or lower alkyl, and one of T2 and T3 can also be t-octyl, as light stabilisers for organic material, processes for their preparation, the organic material finished with these compounds and especially lacquer finished with those compounds.
330477
Dexter Martin
Winter Roland A.e.
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
LandOfFree
2-¬2-hydroxy-3,5-di-(.alpha.,.alpha.-di-methylbenzyl)... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with 2-¬2-hydroxy-3,5-di-(.alpha.,.alpha.-di-methylbenzyl)..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and 2-¬2-hydroxy-3,5-di-(.alpha.,.alpha.-di-methylbenzyl)... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-116934