C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 487/04 (2006.01) A61K 31/41 (2006.01) A61K 31/445 (2006.01) A61K 31/495 (2006.01) A61K 31/535 (2006.01) A61K 31/54 (2006.01) C07D 477/20 (2006.01)
Patent
CA 2073377
ABSTRACT A compound of the formula (I): Image (I) wherein R1 is a hydrogen atom or a methyl group, R2 is a hydrogen atom or a negative charge, R3 is a hydrogen atom or a lower alkyl group, each of R4, R5 and R6 is a hydrogen atom, a cyano group, a methanesulfonyl group, a lower alkyl group which may have substituents, a carbamoyl group which may have substituents or a group of the formula -X-N(R7)R8 {wherein each of R7 and R8 which may be the same or different, is a hydrogen atom or a lower alkyl group which may have substituents, or R7 and R8 form, together with the adjacent nitrogen atom and, if necessary, together with a hetero atom selected from the group consisting of a nitrogen atom, an oxygen atom and a sulfur atom in addition to the adjacent nitrogen atom, a 3- to 8-membered heterocyclic group which may be substituted (provided that either the nitrogen atom adjacent to X or other nitrogen atom on the heterocyclic ring may form an ammonio group), and X is a lower alkylene group which may have substituents}, provided that at least one of R4, R5 and R6 is the group of the formula X-N(R7)R8 wherein R7, R8 and X are as defined above, and Y is a lower alkylene group or a single bond; or a pharmaceutically acceptable salt or ester thereof.
Nakagawa Susumu
Ohtake Norikazu
Okada Shigemitsu
Ushijima Ryosuke
Banyu Pharmaceutical Co. Ltd.
Smart & Biggar
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