C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/240.8
C07D 243/14 (2006.01)
Patent
CA 1039281
ABSTRACT Compounds of the formula Image wherein X and X1 are independently selected from hydrogen, lower alkyl, lower alkoxy, halo, and trifluoromethyl and the acid-addition and quaternary salts thereof are disclosed. These compounds are useful as hypotensive agents.
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