C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
C07H 9/04 (2006.01) A61K 31/70 (2006.01)
Patent
CA 2359986
This invention relates generally to compounds and processes for synthesizing derivatives of 2-3-<u>O</u>- isopropylidene-.alpha. -L-xylo-2- hexulofuranosonic acid, of formula (I) compounds of this invention are useful, inter-alia, for the inhibition and prevention of cell adhesion and cell adhesion-mediated pathologies, including inflammatory and autoimmune diseases, such as bronchial asthma, rheumatoid arthritis, type I diabetes, multiple sclerosis, allograft rejection and psoriasis. This invention also relates to pharmacological compositions containing derivatives of 2-3-<u>O</u>- isopropylidene-.alpha. -L-xylo-2- hexulofuranosonic acid and the methods of treating such pathologies as listed above.
De façon générale, cette invention concerne des composés et des méthodes permettant de synthétiser des dérivés d'acide 2-3-<u>O</u>-isopropylidène-.alpha.-L-xylo-2-hexulofuranosonique représenté par la formule (I). Ces composés favorisent, entre autres choses, l'inhibition et la prévention de l'adhésion cellulaire et des pathologies causées par l'adhésion cellulaire, dont les maladies inflammatoires et auto-immunes telles que l'asthme, la polyarthrite rhumatoïde, le diabète de type I, la sclérose en plaques, les rejets d'allogreffes et le psoriasis. L'invention concerne également des compositions pharmaceutiques renfermant des dérivés d'acide 2-3-<u>O</u>-isopropylidène-.alpha.-L-xylo-2-hexulofuranosonique et des méthodes de traitement des pathologies susmentionnées.
Arora Sudershan K.
Gupta Jang Bahadur
Joshi Vishwas D.
Kishore Nawal
Deeth Williams Wall Llp
Ranbaxy Laboratories Limited
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