C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/277.3
C07D 221/14 (2006.01) C07D 401/14 (2006.01)
Patent
CA 1088540
Abstract New compounds which exhibit antidepressant acti- vity and are also useful as antiinflammatory agents, have the following formula Image wherein R1 and R2 are independently selected from hydrogen, halogen, lower alkyl, lower alkoxy, lower alkylthio, nitro, amino, trifluoromethyl and cyano: R3 is hydrogen or lower alky; R4 and R5 are independently selected from hydrogen, lower alkyl, lower alkoxy and halogen; A is straight or branched chain alkylene of 1 to 8 carbons; the dashed line indicates the optional presence of a double bond; and a pharmaceutically acceptable acid addition salt thereof.
251630
Vogt Berthold R.
Wade Peter C.
E. R. Squibb & Sons Inc.
Osler Hoskin & Harcourt Llp
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