C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/261
C07D 239/48 (2006.01)
Patent
CA 1079731
ABSTRACT OF THE DISCLOSURE Compounds of the formula (II): Image (II) and pharmaceutically acceptable salts thereof wherein R is a hydrogen atom or a methyl or ethyl group; X is an alkylene group of 1 to 10 carbon atoms; Y is O, S or a bond and Ar is an aryl group, are disclosed having antimalarial and antibacterial activity. Methods of preparation are also disclosed.
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