C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/180, 260/250
C07D 413/04 (2006.01) C07D 413/14 (2006.01) C07D 417/14 (2006.01) C07K 5/078 (2006.01)
Patent
CA 1285950
Abstract of the Disclosure The compound represented by the formula: Image where R1 stands for amino or an organic residue bonded through nitrogen; R2 stands for carboxyl or a group derivable therefrom; R3, R4, R5, R6, R7 and R8 independently stand for hydrogen or an organic residue, including the case where R5 or R6 forms a chemical bond or a ring with R7 or R8; X stands for hydrogen, methoxy or formyl- amino; or a salt thereof, produceable by the present method, exhibits excellent antimicrobial activity, and is utilized as antimicrobial agents.
507875
Kawano Yasuhiko
Morimoto Akira
Natsugari Hideaki
Yoshioka Kouichi
Fetherstonhaugh & Co.
Kawano Yasuhiko
Morimoto Akira
Natsugari Hideaki
Takeda Chemical Industries Ltd.
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