C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/235.95
C07D 295/22 (2006.01) C07D 213/77 (2006.01) C07D 215/42 (2006.01) C07D 233/80 (2006.01) C07D 295/30 (2006.01)
Patent
CA 1119170
ABSTRACT The invention provides novel 2-adamantyl hydrazine derivatives of the general formula A Image A In this formula Rl is hydrogen or a lower alkyl group of 1-4 carbon atoms; R2 and R3 are the same or different and are each hydrogen, an unsub- stituted or substituted radical being a lower alkyl of 1-4 carbon atoms, a lower alkanoic acid radical of 2-4 carbon atoms or a lower alkyl ester thereof, adamantyl, aryl, aralkyl, in which the alkyl moiety has from 1-4 carbon atoms or an unsukstituted or substituted heterocyclic radical of aromatic character; or R2 and R3 together with the nitrogen atom to which they are attached form an unsubstituted or substituted non-aromatic cyclic radical. The invention further provides pharmaceutically acceptable acid addition salts of the above compounds. Several methods of preparation of the new compounds are described. The novel compounds according to the invention possess valuable antifungal (human and plant), antiviral, antiprotozoal and antimicrobial properties.
315361
Sterling Jeffery
Suchi Raul
Weiner Ben-Zion
Yellin Haim
Gowling Lafleur Henderson Llp
Teva Pharmaceutical Industries Ltd.
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