C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/315.35
C07D 231/54 (2006.01) C07C 49/683 (2006.01) C07D 231/56 (2006.01)
Patent
CA 1065324
Abstract New compounds, useful as central nervous system depressants, have the following formula Image wherein X is hydrogen, halogen, lower alkyl, lower alkoxy or trifluoromethyl; R is hydrogen or lower alkyl with the proviso that only one occurrence of R may be lower alkyl; m is an integer from 2 to 4; A is straight or branched alkylene of from 1 to 8 carbon atoms; B is -NH2, Image , Image , or Image wherein R1 is lower alkyl and R2 is phenyl or phenyl-lower alkyl; and the acid-addition and quaternary salts and N-oxides thereof.
226132
Krapcho John
Turk Chester F.
LandOfFree
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