C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/231, 167/240
C07D 209/10 (2006.01) A61K 31/40 (2006.01) A61K 31/44 (2006.01) C07D 209/14 (2006.01) C07D 401/04 (2006.01)
Patent
CA 2020298
- 1 - HOE 89/S 032 ABSTRACT OF THE DISCLOSURE There are described compounds of the formula Image where A is CH or N; X is hydrogen, loweralkyl, halogen, trifluromethyl, loweralkoxy, arylloweralkoxy, hydroxy or phenylamino; Y is hydrogen, loweralkyl, halogen, loweralkoxy, arylloweralkoxy or hydroxy; R1 is hydrogen or loweralkyl; R2 is hydrogen, loweralkyl, formyl, alkylcarbonyl, arylloweralkylcarbonyl, arylcarbonyl, alkoxycarbonyl, arylloweralkoxycarbonyl or aryloxycarbonyl; R3 is hydrogen, alkyl, alkylcarbonyl, arylloweralkylcarbonyl, arylcarbonyl, alkoxycarbonyl, arylloweralkoxycarbonyl, aryloxycarbonyl or -CH2CO2C2H5; which compounds are useful as topical antiinflammatory agents for the treatment of skin disorders, and a process for their preparation.
Gardenhire Eileen M.
Helsley Grover C.
Tegeler John J.
Bereskin & Parr
Gardenhire Eileen M.
Helsley Grover C.
Hoechst-Roussel Pharmaceuticals Inc.
Tegeler John J.
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