C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/211, 260/251
C07D 405/14 (2006.01) A01N 43/60 (2006.01) A01N 43/653 (2006.01) A61K 31/495 (2006.01) C07D 213/72 (2006.01) C07D 213/85 (2006.01) C07D 215/54 (2006.01) C07D 237/34 (2006.01) C07D 239/14 (2006.01) C07D 239/42 (2006.01) C07D 409/14 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1290333
ABSTRACT OF THE DISCLOSURE: Compounds I Image where A equals CH or N; Ar equals naphthyl, thienyl or phenyl; R1 equals alkyl, F or C1; g equals zero, 1 or 2; and Y equals various heterocyclic bases, and the acid- addition salts thereof, are described. Several preparation processes are described. The compounds IIIa Image where R1, 9 and Y are as specified in the case of the formula I, serve as intermediates for the preparation of these compounds. Processes are also specified for the preparation of IIIa. I represent valuable antimycotics.
532657
Dittmar Walter
Hanel Heinz
Kampe Klaus-Dieter
Raether Wolfgang
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Dittmar Walter
Hanel Heinz
Hoechst Aktiengesellschaft
Kampe Klaus-Dieter
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