C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/223, 167/233
C07D 405/14 (2006.01) A01N 43/52 (2006.01) A01N 43/60 (2006.01) A01N 43/653 (2006.01) A01N 43/74 (2006.01) C07D 263/56 (2006.01) C07D 263/57 (2006.01) C07D 263/58 (2006.01) C07D 263/60 (2006.01) C07D 277/64 (2006.01) C07D 277/66 (2006.01) C07D 409/14 (2006.01) C07D 413/14 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1277664
Abstract of the Disclosure Compounds of the formula I I, Image and the acid-addition salts thereof, where A = CH or N; Ar = naphthyl, thienyl or phenyl; Z = oxygen or sulfur; R1 _ alkyl, F or Cl; 9 = 0-2; L = 0 or 1; m = 0-4; p = 0 or 1; X = O, S or N-R3; R2 = alkyl, alkoxy, halogen, SCH3, C0C6Hs, CF3, COOCH3, COOC2H5, or N02; n - 0-2; R2, under certain circumstances, is alternatively -CH=CH-CH=CH- or phenoxy are described. Processes for the preparation thereof are also described. Compounds IIIa Image IIIa are valuable intermediates for the preparation of I. The compounds I serve as antimycotics.
532653
Dittmar Walter
Kampe Klaus-Dieter
Raether Wolfgang
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Dittmar Walter
Hoechst Aktiengesellschaft
Kampe Klaus-Dieter
Raether Wolfgang
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