C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
71/10.5, 260/556
C07C 103/375 (1980.01)
Patent
CA 1110662
Abstract of the Disclosure Compounds of the formula Image wherein R1 and R2 are each lower alkyl (C1-C2) and R3 is hydrogen or lower alkyl (C1-C2), are disclosed as useful for the control of undesirable plant species. The new compounds are prepared by chloroacetylation of the corres- ponding N-isopropylaniline compound.
299321
Diehl Robert E.
Lutz Albert W.
American Cyanamid Company
Smart & Biggar
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