C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
402/1, 260/304,
C07D 263/34 (2006.01) C07D 263/57 (2006.01) C07D 413/00 (2006.01) G03C 1/675 (2006.01) G03C 1/72 (2006.01) G03F 7/004 (2006.01)
Patent
CA 1168656
ABSTRACT OF THE DISCLOSURE This invention relates to a novel 2-(halogenomethyl- phenyl)-4-halogeno-oxazole derivative; to a radiation-sensitive composition which, as the radiation-sensitive compound, contains a 2-halogenomethyl-phenyl)-4-halogeno-oxazole derivative; and to a process for the preparation of the novel 2-(halogenomethyl- phenyl)-4-halogeno-oxazole derivatives. The novel 2-(halogeno- methyl-phenyl)4-halogeno-oxazole derivative has the general formula I Image I wherein Hal1 is a halogen atom, Hal2 is a chlorine or bromine atom, m is an integer from 1 to 3, n is an integer from 1 to 4, R1 is a hydrogen atom or a further CH3-mHal2m group, and R2 is a 1-valent or 2-valent, at most tetranuclear aromatic or heteroaromatic radical which may be partially hydrogenated, and at an unsaturated ring carbon atom, is linked, directly or via a chain which contains up to four exclusively unsaturated carbon atoms, to the oxazolyl part of the molecule according to the general formula I.
378868
Fetherstonhaugh & Co.
Hoechst Aktiengesellschaft
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