C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/101.5
C07D 501/20 (2006.01) C07D 277/20 (2006.01)
Patent
CA 1117104
ABSTRACT OF THE DISCLOSURE New 2-lower alkyl-7-substituted-2-or 3-cephem-4- carboxylic acid compounds are provided of the formula: Image wherein R1 is (C1 to C6)alkyl, R2 is carboxy or a protected carboxy group, R3 is amino or a protected amino group, and A is hydroxyimino(C1 to C6)alkylene or (C1 to C6)- alkoxyimino(C1 to C6)alkylene, and the tautomeric forms and pharmaceutically acceptable salts thereof; the new compounds have antimicrobial activity and inhibit the growth of both gram positive and gram- negative bacteria.
281290
Kamiya Takashi
Takaya Takao
Fujisawa Pharmaceutical Co. Ltd.
Sherman
LandOfFree
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