C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/277.7, 260/2
C07D 401/12 (2006.01)
Patent
CA 1173444
Abstract The invention relates to 2-pyridinecaboxamide derivatives of the formula: Image (I) wherein R1 is hydrogen, lower alkyl, lower alkoxy, halogen, lower alkyl-thio or nitro and is in the 3rd-, 4th- or 5th-position of the pyridyl group, and R2 is hydrogen, lower alkyl, lower alkoxy, phenoxy, phenyl- lower alkyl, phenyl-lower alkenyl, or halogen. These 2-pyridinecarboxamide derivatives, and pharmaceutically acceptable salts thereof, are useful as anti-allergic agents.
391618
Honma Yasushi
Takeda Mikio
Tsuzurahara Kei
Kirby Eades Gale Baker
Tanabe Seiyaku Co. Ltd.
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