C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/281.5
C07D 215/22 (2006.01) C07D 215/48 (2006.01)
Patent
CA 1191140
ABSTRACT OF THE DISCLOSURE Substituted 2-quinolone derivatives of the general formula Image are described, wherein the groups R1 - R5 are chosen from hydrogen, alkyl, hydrogen, alkoxy, nitro, cyano, halo alkyl and -COOR6 in which R6 is hydrogen or lower alkyl, provided that not all of R1 - R5 are hydrogen. These compounds find use as remedies for allergic diseases and asthma, and as antitussives and expectorants. Processes for the preparation of these compounds are also described. These compounds have the advantages of being long-acting and orally administerable.
430732
Adachi Masahiro
Aoyagi Yoshiaki
Chokai Shoichi
Enomoto Hiroshi
Inoue Kichiro
Fetherstonhaugh & Co.
Nippon Shinyaku Co. Ltd.
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