C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/277.3
C07D 401/06 (2006.01) C07D 221/06 (2006.01) C07D 221/14 (2006.01)
Patent
CA 1068705
ABSTRACT This invention describes compounds of the formula Image wherein R1 and R2 each are independently selected from hydrogen, halogen, lower alkyl, lower alkoxy, lower alkylthio, nitro, cyano, amino, and trifluoromethyl; A is a straight or branched chain alkylene of 1 to 8 carbons; and Z is selected from Image , Image , Image , and Image wherein R3 is selected from phenyl, phenyl-lower alkyl and sub- stituted phenyl and phenyl-lower alkyl and said phenyl substituents are one or more selected from halogen, lower alkyl, lower alkoxy, nitro, amino, and trifluoromethyl; and the pharmaceutically acceptable acid addition salts thereof. The compounds have anti-depressant and anti-anxiety properties.
232810
Vogt Berthold R.
Wade Peter C.
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