C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/271.3
C07D 453/04 (2006.01) A61K 31/49 (2006.01) C07D 215/12 (2006.01) C07D 215/18 (2006.01) C07D 215/233 (2006.01) C07D 453/02 (2006.01)
Patent
CA 1039283
Abstract Compounds of the general formulae Image and Image I II wherein R1 is halogen or trifluoromethyl and R2 is ethyl or vinyl, enantiomers and racemates thereof, as well as their prepa- ration are disclosed. These compounds are useful as anti- malaria agents.
215292
Grethe Guenter
Uskokovic Milan R.
LandOfFree
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