C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/510.1, 260/3
C07D 209/48 (2006.01) C07D 307/89 (2006.01) C08F 10/00 (2006.01) G03F 7/031 (2006.01)
Patent
CA 1151186
Abstract Novel compounds of the formula I or II Image or Image (I) (II) are described, in which M1 and M2 individually are -OH or together are -O-, R is hydrogen, C1-20-alkyl, C2-5-alkenyl, C3-5-alkynyl, C5-12-cycloalkyl, benzyl, phenyl or toluyl, X is -NO2, -OR', -SR' or -SO2R' and the (R')s independently of one another are C1-20-alkyl, C3-5-alkenyl, C3-5-alkynyl, C2-4-monohydroxyalkyl, C1-12-halogenalkyl, benzyl, C5-12- cycloalkyl, phenyl, carboxyphenyl, halogenophenyl, nitro- phenyl, alkyl- or alkoxy-phenyl each having 1-4 C atoms in the alkyl or alkoxy moieties, or acetylaminophenyl. The compounds (I) and compounds (II) in which M1 and M2 together are -O- are suitable as sensitisers for photo- crosslinkable polymers or as initiators for the photo- polymerisation of ethylenically unsaturated compounds or for the photochemical crosslinking of polyolefins.
376825
Fischer Walter
Kvita Vratislav
Zweifel Hans
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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