C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/310.5
C07D 277/38 (2006.01)
Patent
CA 1209577
ABSTRACT OF THE DISCLOSURE Compounds of the formula (III): Image (III) wherein R1 is amino, lower alkylamino, a protected amino, or a protected lower alkylamino, R4 is hydrogen or halogen, and R5 is carboxy or a protected carboxy, or salts thereof, are useful as intermediates for the preparation of 3,7-disubstituted-3-cephem-4- carboxylic acid compounds having antimicrobial activity.
477197
Kamiya Takashi
Nakai Yoshiharu
Sakane Kazuo
Tanaka Kunihiko
Fujisawa Pharmaceutical Co. Ltd.
Marcoux & Sher Swabey Mitchell Houle
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