C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/471, 260/387
C07D 333/32 (2006.01) C07D 333/36 (2006.01)
Patent
CA 1058168
ABSTRACT OF THE DISCLOSURE ADT derivatives in free condition or their corre- sponding acid salts, organic or mineral bases, in which the ADT derivatives contain the group -S-CH2-CH2-CH(NHR)-CO- in the cyclical form Image in which R repre- sents an acyl group containing more than 4 carbon atoms and sunstituted when it is cynnamoyl, and the open form R'-S-CH2-CH2-CH-(NHR)-CO-X-R" in which X is oxygen or sulfur, R' and R are the same or different and are selected from the group of hydrogen and acyl radicals, R" is hydrogen or a sub- stituted alcoyl much that R" has at least 2 carbon atoms when X is oxygen, R is a lower acyl and R' is hydrogen.
222416
Blum Jean
Na
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