3- and 4-azidophthalic acid derivatives

C - Chemistry – Metallurgy – 07 – D

Patent

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260/512.1, 260/3

C07D 209/48 (2006.01) B29C 65/48 (2006.01) B29C 65/78 (2006.01) G03F 7/012 (2006.01)

Patent

CA 1108626

Abstract of the Disclosure The compounds according to the invention have the formulae Ia or Ib Image or Image (Ia) (Ib) in which Y is a divalent organic radical and Z is -NH2, -NH-alkyl having 1-4 C atoms, -OH, -COOH, -COCl, O-CO-CH=CH2, Image , -COO-CH=CH2 or -O-CH=CH2. These novel 3- or 4-azidophthalic acid derivatives may be used for the preparation of photo-crosslinkable polymers. Compared to corresponding photosensitive polymers of the prior art, these novel polymers have the advantages that they are even more photosensitive and that they also absorb in the long wavelength UV region (at wavelengths greater than 320 nm).

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